Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

Cheema, Suraj S. ; Shanker, Nirmaan ; Wang, Li-Chen ; Hsu, Cheng-Hsiang ; Hsu, Shang-Lin ; Liao, Yu-Hung ; San Jose, Matthew ; Gomez, Jorge ; Chakraborty, Wriddhi ; Li, Wenshen ; Bae, Jong-Ho ; Volkman, Steve K. ; Kwon, Daewoong ; Rho, Yoonsoo ; Pinelli, Gianni ; Rastogi, Ravi ; Pipitone, Dominick ; Stull, Corey ; Cook, Matthew ; Tyrrell, Brian ; Stoica, Vladimir A. ; Zhang, Zhan ; Freeland, John W. ; Tassone, Christopher J. ; Mehta, Apurva ; Saheli, Ghazal ; Thompson, David ; Suh, Dong Ik ; Koo, Won-Tae ; Nam, Kab-Jin ; Jung, Dong Jin ; Song, Woo-Bin ; Lin, Chung-Hsun ; Nam, Seunggeol ; Heo, Jinseong ; Parihar, Narendra ; Grigoropoulos, Costas P. ; Shafer, Padraic ; Fay, Patrick ; Ramesh, Ramamoorthy ; Mahapatra, Souvik ; Ciston, Jim ; Datta, Suman ; Mohamed, Mohamed ; Hu, Chenming ; Salahuddin, Sayeef

Nature (London), 2022-04, Vol.604 (7904), p.65-71 [Periódico revisado por pares]

London: Nature Publishing Group

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