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Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition

Bessergenev, V.G. ; Pereira, R.J.F. ; Mateus, M.C. ; Khmelinskii, I.V. ; Vasconcelos, D.A. ; Nicula, R. ; Burkel, E. ; Botelho do Rego, A.M. ; Saprykin, A.I.

Thin solid films, 2006-05, Vol.503 (1-2), p.29-39 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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  • Título:
    Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition
  • Autor: Bessergenev, V.G. ; Pereira, R.J.F. ; Mateus, M.C. ; Khmelinskii, I.V. ; Vasconcelos, D.A. ; Nicula, R. ; Burkel, E. ; Botelho do Rego, A.M. ; Saprykin, A.I.
  • Assuntos: CVD ; Photocatalysis ; Thin films ; Titanium dioxide
  • É parte de: Thin solid films, 2006-05, Vol.503 (1-2), p.29-39
  • Notas: ObjectType-Article-2
    SourceType-Scholarly Journals-1
    ObjectType-Feature-1
    content type line 23
  • Descrição: Titanium dioxide (TiO2) thin films were prepared using Titanium [bis(dipiraloymethanate) diisopropoxide] (Ti(dpm)2(OPri)2) and Titanium isopropoxide (Ti(OPri)4) complex compound precursors by Chemical Vapour Deposition (CVD) and photo-assisted CVD. Structural information on TiO2 thin films was obtained in synchrotron radiation experiments: high-resolution Grazing Incidence X-ray Diffraction (GIXRD) and θ–2θ XRD experiments were performed on the high-resolution powder diffractometer at the Hamburg Synchrotron Laboratory. Chemical composition of thin films was studied by high-resolution Laser Ionization Mass Spectrometry technique, surface composition by X-ray Photoelectron Spectroscopy, and surface morphology by Atomic Force Microscopy. Photocatalytic activity of TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High Performance Liquid Chromatography.
  • Editor: Lausanne: Elsevier B.V
  • Idioma: Inglês;Russo

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