X-ray scattering by the fused silica surface etched by low-energy Ar ions
Barysheva, M M ; Chkhalo, N I ; Drozdov, M N ; Mikhailenko, M S ; Pestov, A E ; Salashchenko, N N ; Vainer, Y A ; Yunin, P A ; Zorina, M V
Journal of X-ray science and technology, 2019-01, Vol.27 (5), p.857-870 [Periódico revisado por pares]Netherlands
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