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Aluminum plasma immersion ion implantation in polymers

Ueda, M. ; Tan, I.H. ; Dallaqua, R.S. ; Rossi, J.O. ; Barroso, J.J. ; Tabacniks, M.H.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-05, Vol.206 (Complete), p.760-766 [Revista revisada por pares]

Elsevier B.V

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Título:
Aluminum plasma immersion ion implantation in polymers
Autor: Ueda, M. ; Tan, I.H. ; Dallaqua, R.S. ; Rossi, J.O. ; Barroso, J.J. ; Tabacniks, M.H.
Materias: Oxidation ; Plasma immersion ion implantation ; Polymers ; Vacuum arcs
Es parte de: Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-05, Vol.206 (Complete), p.760-766
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descripción: Atomic oxygen (AO) degradation of polymer-based materials is a serious concern in long life satellites or space stations orbiting low Earth orbit environment. Protection against AO can be achieved by a thin metal oxide layer on the polymer’s surface. Metal implantation followed by oxidation is a promising way of creating this layer with superior adhesion to the substrate. This work reports on the implantation of Kapton, Mylar, polypropylene and polyethylene samples with aluminum ions at 2.5, 5 and 7 kV, by plasma immersion in a vacuum arc plasma with a straight magnetic filter. With samples oriented with surfaces parallel to the plasma stream SEM and EDS analysis showed no macroparticle contamination and no significant changes in morphology after implantation. Rutherford backscattering spectroscopy showed retained doses of (1–3) × 10 16 cm −2, with most of the aluminum concentrated on the surface. This is probably due to deposition of aluminum between high voltage pulses, and reduction in the sample’s surface voltage due to surface charging.
Editor: Elsevier B.V
Idioma: Inglés

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Aluminum plasma immersion ion implantation in polymers

Ueda, M. ; Tan, I.H. ; Dallaqua, R.S. ; Rossi, J.O. ; Barroso, J.J. ; Tabacniks, M.H.

Elsevier B.V

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