Plasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fields
Tan, I.H. ; Ueda, M. ; Oliveira, R.M. ; Dallaqua, R.S. ; Reuther, H.
Surface & coatings technology, 2007-02, Vol.201 (9), p.4826-4831 [Revista revisada por pares]Lausanne: Elsevier B.V
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