Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1-419.8 nm emission line pair

Boffard, John B ; Wang, S ; Lin, Chun C ; Wendt, A E

Plasma sources science & technology, 2015-10, Vol.24 (6), p.65005 [Periódico revisado por pares]

IOP Publishing

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