Idioma:

Advanced FIB mask repair technology for 100nm/ArF lithography (2)

HAGIWARA, Ryoji ; YASAKA, Anto ; MATSUDA, Osamu ; OKABE, Mamoru ; SHINOHARA, Shoji ; HASUDA, Masakatsu ; ADACHI, Tatsuya ; MORIKAWA, Yasutaka ; NISHIGUCHI, Masaharu ; SATO, Yasushi ; HAYASHI, Naoya ; OZAWA, Toshiya ; AITA, Kazuo ; TANAKA, Yoshihiro ; YOSHIOKA, Nobuyuki ; TAKAOKA, Osamu ; KOYAMA, Yoshihiro ; KOZAKAI, Tomokazu ; DOI, Toshio ; MURAMATSU, Masashi ; SUZUKI, Katsumi ; SUGIYAMA, Yasuhiko

SPIE proceedings series, 2003, p.510-519

Texto completo disponível

Citações Citado por

Título:
Advanced FIB mask repair technology for 100nm/ArF lithography (2)
Autor: HAGIWARA, Ryoji ; YASAKA, Anto ; MATSUDA, Osamu ; OKABE, Mamoru ; SHINOHARA, Shoji ; HASUDA, Masakatsu ; ADACHI, Tatsuya ; MORIKAWA, Yasutaka ; NISHIGUCHI, Masaharu ; SATO, Yasushi ; HAYASHI, Naoya ; OZAWA, Toshiya ; AITA, Kazuo ; TANAKA, Yoshihiro ; YOSHIOKA, Nobuyuki ; TAKAOKA, Osamu ; KOYAMA, Yoshihiro ; KOZAKAI, Tomokazu ; DOI, Toshio ; MURAMATSU, Masashi ; SUZUKI, Katsumi ; SUGIYAMA, Yasuhiko
Assuntos: Applied sciences ; Electronics ; Exact sciences and technology ; Imaging devices ; Microelectronic fabrication (materials and surfaces technology) ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Testing, measurement, noise and reliability
É parte de: SPIE proceedings series, 2003, p.510-519
Editor: Bellingham WA: SPIE
Idioma: Inglês

Links

Voltar para lista de resultados