Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers

García-Valenzuela, J.A. ; Rivera, R. ; Morales-Vilches, A.B. ; Gerling, L.G. ; Caballero, A. ; Asensi, J.M. ; Voz, C. ; Bertomeu, J. ; Andreu, J.

Thin solid films, 2016-11, Vol.619, p.288-296 [Revista revisada por pares]

Elsevier B.V

Texto completo disponible