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Effect of gas species and partial pressure on chromium thin film adhesion

Torkington, R. S. ; Vaughan, J. G.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1985-05, Vol.3 (3), p.795-798 [Periódico revisado por pares]

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Título:
Effect of gas species and partial pressure on chromium thin film adhesion
Autor: Torkington, R. S. ; Vaughan, J. G.
É parte de: Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1985-05, Vol.3 (3), p.795-798
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descrição: Vacuum evaporated chromium thin films on glass substrates were evaluated for adhesion by the scratch test as a function of partial pressures of Ar, H2, CH4, O2, CO, and CO2 deliberately introduced during chromium deposition. Partial pressures examined ranged from 0.67 to 13.3 mPa. Initial adhesion results suggest a reactive evaporation process of chromium with O2, CO, and CO2 backfills and are in agreement with the theory of an oxide layer formation causing increased initial adhesion. Gas/chromium atom impingement ratios corresponding to noticeably improved adhesion are reported. Time dependent adhesion results reveal a distinction in adhesion behavior between films deposited in O2, CO, and CO2 backfills and those deposited in Ar, CH4, and H2 backfills. Possible mechanisms for this behavior are discussed.
Idioma: Inglês

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