Controlling Filament Stability in Scaled Oxides (3 nm) for High Endurance (>106) Low Voltage ITO/HfO2 RRAMs for Future 3D Integration
Mamidala, Saketh, Ram ; Persson, Karl-Magnus ; Wernersson, Lars-Erik
2021 Device Research Conference (DRC),Santa Barbara, CA, United States,2021-06-20 - 2021-06-23, 2021Texto completo disponível
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