The Effect of Physical Property Parameters of the Insulation Material Inside the Heat Shield on the Growth of Czochralski Silicon Crystal

Hu, Rongrong ; Lv, Xuekang ; Li, Jiacheng ; Ali, Salamat ; Qi, Jing

SILICON, 2024-02, Vol.16 (4), p.1559-1567 [Periódico revisado por pares]

Dordrecht: Springer Netherlands

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