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An optically pumped 2.5 μm GeSn laser on Si operating at 110 K

Al-Kabi, Sattar ; Ghetmiri, Seyed Amir ; Margetis, Joe ; Pham, Thach ; Zhou, Yiyin ; Dou, Wei ; Collier, Bria ; Quinde, Randy ; Du, Wei ; Mosleh, Aboozar ; Liu, Jifeng ; Sun, Greg ; Soref, Richard A. ; Tolle, John ; Li, Baohua ; Mortazavi, Mansour ; Naseem, Hameed A. ; Yu, Shui-Qing

Applied physics letters, 2016-10, Vol.109 (17) [Periódico revisado por pares]

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Título:
An optically pumped 2.5 μm GeSn laser on Si operating at 110 K
Autor: Al-Kabi, Sattar ; Ghetmiri, Seyed Amir ; Margetis, Joe ; Pham, Thach ; Zhou, Yiyin ; Dou, Wei ; Collier, Bria ; Quinde, Randy ; Du, Wei ; Mosleh, Aboozar ; Liu, Jifeng ; Sun, Greg ; Soref, Richard A. ; Tolle, John ; Li, Baohua ; Mortazavi, Mansour ; Naseem, Hameed A. ; Yu, Shui-Qing
É parte de: Applied physics letters, 2016-10, Vol.109 (17)
Descrição: This paper reports the demonstration of optically pumped GeSn edge-emitting lasers grown on Si substrates. The whole device structures were grown by an industry standard chemical vapor deposition reactor using the low cost commercially available precursors SnCl4 and GeH4 in a single run epitaxy process. Temperature-dependent characteristics of laser-output versus pumping-laser-input showed lasing operation up to 110 K. The 10 K lasing threshold and wavelength were measured as 68 kW/cm2 and 2476 nm, respectively. Lasing characteristic temperature (T0) was extracted as 65 K.
Idioma: Inglês

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