0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light

Nakao, Shuji ; Nakae, Akihiro ; Tsujita, AtsumiYamaguchi ; Wakamiya, Wataru

Japanese Journal of Applied Physics, 1999-05, Vol.38 (5R), p.2686 [Periódico revisado por pares]

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