0.05 µm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System

Higashiki, Tatsuhiko ; Tojo, Toru ; Takahashi, Yoshihiko ; Tabata, Mitsuo ; Nishizaka, Takeshi ; Kuwabara, Osamu ; Uchida, Norio ; Yoshino, Hisakazu ; Saito, Susumu

Japanese Journal of Applied Physics, 1992-12, Vol.31 (12S), p.4161 [Periódico revisado por pares]

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