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Low-temperature deposition of diamond films for optical coatings

ONG, T. P ; CHANG, R. P. H

Applied physics letters, 1989-11, Vol.55 (20), p.2063-2065 [Revista revisada por pares]

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Título:
Low-temperature deposition of diamond films for optical coatings
Autor: ONG, T. P ; CHANG, R. P. H
Materias: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics
Es parte de: Applied physics letters, 1989-11, Vol.55 (20), p.2063-2065
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descripción: A low-temperature (≊400 °C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50–200 Å. The optical transparency of the films is over 60% in the range 0.6–2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.
Editor: Melville, NY: American Institute of Physics
Idioma: Inglés

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