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Surface analysis of chemically-etched and plasma-treated polyetheretherketone (PEEK) for biomedical applications

Ha, S.-W. ; Hauert, R. ; Ernst, K.-H. ; Wintermantel, E.

Surface & coatings technology, 1997-11, Vol.96 (2), p.293-299 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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Título:
Surface analysis of chemically-etched and plasma-treated polyetheretherketone (PEEK) for biomedical applications
Autor: Ha, S.-W. ; Hauert, R. ; Ernst, K.-H. ; Wintermantel, E.
Assuntos: Chemical etching ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Oxygen plasma treatment ; Physics ; Polyetheretherketone ; Radiation treatment (particle and electromagnetic) ; Radiation treatments ; Treatment of materials and its effects on microstructure and properties
É parte de: Surface & coatings technology, 1997-11, Vol.96 (2), p.293-299
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descrição: Surface modifications of polyetheretherketone (PEEK) made by chemical etching or oxygen plasma treatment were examined in this study. Chemical etching caused surface topography to become irregular with higher roughness values R a and R q. Oxygen plasma treatment also affected surface topography, unveiling the spherulitic structure of PEEK. R a, R q and surface area significantly increased after plasma treatment; topographical modifications were, nonetheless, moderate. Wetting angle measurements and surface energy calculations revealed an increase of wettability and surface polarity due to both treatments. XPS measurements showed an increase of surface oxygen concentration after both treatments. An O:C ratio of 3.10 for the plasma-treated PEEK surface and 4.41 for the chemically-etched surface were determined. The results indicate that surface activation by oxygen plasma treatment for subsequent coating processes in supersaturated physiological solutions to manufacture PEEK for biomedical appiications is preferable over the chemical etching treatment.
Editor: Lausanne: Elsevier B.V
Idioma: Inglês

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Surface analysis of chemically-etched and plasma-treated polyetheretherketone (PEEK) for biomedical applications

Ha, S.-W. ; Hauert, R. ; Ernst, K.-H. ; Wintermantel, E.

Lausanne: Elsevier B.V

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