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Papers from the Eighth International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors

International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors (8th 2005 Daytona Beach, Fla.) Joseph Kopanski; American Vacuum Society

Journal of Vacuum Science & Technology B 2nd, ser., vol.24, n.1, 2006

Localização: IF - Instituto de Física (J.Vac.Sci.Technol.B 24(1)2006 )(Acessar)

Título:
Papers from the Eighth International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors
Autor: International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors (8th 2005 Daytona Beach, Fla.)
Joseph Kopanski; American Vacuum Society
Assuntos: Semiconductor doping -- Congresses; Semiconductors -- Design and construction -- Congresses; SEMICONDUTORES (CONGRESSOS)
É parte de: Journal of Vacuum Science & Technology B 2nd, ser., vol.24, n.1, 2006
Notas: Includes bibliographical references and index
Editor: New York Published by AVS through the American Institute of Physics
Data de criação/publicação: 2006
Formato: A18, L9, 522 p. ill. (some col.) 28 cm.
Idioma: Inglês

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