Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

Alexandre Mantovani Nardes Adnei Melges de Andrade 1943-; Fernando Josepetti Fonseca 1959-; Ely Antonio Tadeu Dirani; Reginaldo Muccillo; Eliana Navarro dos Santos Muccillo

Journal of Materials Science: materials in electronics London v.14, n. 5-7, p.407-411, May-Jul 2003

London 2003

Item não circula. Consulte sua biblioteca.(Acessar)