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Refined by: Journal Title: Acta Materialia remove subject: Materials Science remove subject: Physics remove
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1
Supertoughening in B1 transition metal nitride alloys by increased valence electron concentration
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Supertoughening in B1 transition metal nitride alloys by increased valence electron concentration

Sangiovanni, D.G. ; Hultman, L. ; Chirita, V.

Acta materialia, 2011-03, Vol.59 (5), p.2121-2134 [Peer Reviewed Journal]

Elsevier Ltd

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2
Structural and mechanical properties of Cr–Al–O–N thin films grown by cathodic arc deposition
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Structural and mechanical properties of Cr–Al–O–N thin films grown by cathodic arc deposition

Khatibi, A. ; Sjölen, J. ; Greczynski, G. ; Jensen, J. ; Eklund, P. ; Hultman, L.

Acta materialia, 2012-11, Vol.60 (19), p.6494-6507 [Peer Reviewed Journal]

Kidlington: Elsevier Ltd

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3
Vacancy-induced toughening in hard single-crystal V0.5Mo0.5Nx/MgO(001) thin films
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Article
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Vacancy-induced toughening in hard single-crystal V0.5Mo0.5Nx/MgO(001) thin films

Kindlund, H. ; Sangiovanni, D.G. ; Lu, J. ; Jensen, J. ; Chirita, V. ; Birch, J. ; Petrov, I. ; Greene, J.E. ; Hultman, L.

Acta materialia, 2014-09, Vol.77, p.394-400 [Peer Reviewed Journal]

Kidlington: Elsevier Ltd

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4
Structural, electrical and mechanical characterization of magnetron-sputtered V–Ge–C thin films
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Structural, electrical and mechanical characterization of magnetron-sputtered V–Ge–C thin films

Wilhelmsson, O. ; Eklund, P. ; Högberg, H. ; Hultman, L. ; Jansson, U.

Acta materialia, 2008-06, Vol.56 (11), p.2563-2569 [Peer Reviewed Journal]

Kidlington: Elsevier Ltd

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5
Epitaxial Ti2AlN(0001) thin film deposition by dual-target reactive magnetron sputtering
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Epitaxial Ti2AlN(0001) thin film deposition by dual-target reactive magnetron sputtering

Persson, P.O.Å. ; Kodambaka, S. ; Petrov, I. ; Hultman, L.

Acta materialia, 2007-08, Vol.55 (13), p.4401-4407 [Peer Reviewed Journal]

Oxford: Elsevier Ltd

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6
The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1-x (x = 0, 0.15 and 0.45) thin films
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The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1-x (x = 0, 0.15 and 0.45) thin films

KARLSSON, L ; HÖRLING, A ; JOHANSSON, M. P ; HULTMAN, L ; RAMANATH, G

Acta materialia, 2002-12, Vol.50 (20), p.5103-5114 [Peer Reviewed Journal]

Oxford: Elsevier Science

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7
Internal stress and microstructure of SiC reinforced aluminium alloy 2014
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Internal stress and microstructure of SiC reinforced aluminium alloy 2014

Weiland, A. ; Hultman, L. ; Wahlström, U. ; Persson, C. ; Johannesson, T.

Acta Materialia, 1998-09, Vol.46 (15), p.5271-5281 [Peer Reviewed Journal]

Oxford: Elsevier Ltd

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8
Control of crystallinity in sputtered Cr–Ti–C films
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Control of crystallinity in sputtered Cr–Ti–C films

Furlan, Andrej ; Lu, Jun ; Hultman, Lars ; Jansson, Ulf

Acta materialia, 2013-10, Vol.61 (17), p.6352-6361 [Peer Reviewed Journal]

Kidlington: Elsevier Ltd

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