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1 |
Material Type: Artigo
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Electron paramagnetic resonance of deep boron in silicon carbideBaranov, P G ; Mokhov, E NSemiconductor science and technology, 1996-04, Vol.11 (4), p.489-494 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
2 |
Material Type: Artigo
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Hole traps in indium-doped and indium-free GaAs grown by molecular beam epitaxyBrehme, S ; Krispin, P ; Lubyshev, D ISemiconductor science and technology, 1992-04, Vol.7 (4), p.467-471 [Periódico revisado por pares]BRISTOL: IOP PublishingTexto completo disponível |
3 |
Material Type: Artigo
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Transition-metal impurities in III-V compoundsClerjaud, BJournal of physics. C, Solid state physics, 1985-07, Vol.18 (19), p.3615-3661London: IOP PublishingTexto completo disponível |
4 |
Material Type: Artigo
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Carrier concentration under high magnetic fieldsCristoloveanu, S ; Chovet, A ; Lakeou, SJournal of physics. C, Solid state physics, 1983-02, Vol.16 (5), p.927-938IOP PublishingTexto completo disponível |
5 |
Material Type: Artigo
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Magnetoconcentration and related galvanomagnetic effects in non-intrinsic semiconductorsCristoloveanu, S ; Lee, J HJournal of physics. C, Solid state physics, 1980-11, Vol.13 (32), p.5983-5997IOP PublishingTexto completo disponível |
6 |
Material Type: Artigo
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EPR and ENDOR investigations of B acceptors in 3C-, 4H- and 6H-silicon carbideGreulich-Weber, S ; Feege, F ; Kalabukhova, K N ; Lukin, S N ; Spaeth, J-M ; Adrian, F JSemiconductor science and technology, 1998-01, Vol.13 (1), p.59-70 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
7 |
Material Type: Artigo
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Exclusion effects revisited: nontraditional use of narrow-gap semiconductorsMalyutenko, V KSemiconductor science and technology, 1993-01, Vol.8 (1S), p.S390-S395 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
8 |
Material Type: Artigo
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Exclusion in the semiconductor p+-p-p+ structure under conditions of a temperature gradientMalyutenko, V K ; Sokolov, V N ; Vainberg, V V ; Piotrowski, T ; Pultorak, JSemiconductor science and technology, 1998-01, Vol.13 (1), p.54-58 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
9 |
Material Type: Artigo
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IR study of exclusion-accumulation effects enhanced by the geometrical factorMalyutenko, V K ; Teslenko, G I ; Vainberg, V V ; Piotrowski, T ; Pultorak, JSemiconductor science and technology, 2000-11, Vol.15 (11), p.1054-1060 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
10 |
Material Type: Artigo
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Negative contrast IR emitting device based on the carrier contact exclusionMalyutenko, V K ; Vainberg, V V ; Teslenko, G I ; Malyutenko, O Yu ; Pultorak, JSemiconductor science and technology, 2003-07, Vol.18 (7), p.697-702 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |