Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Phase change memory technologyBurr, Geoffrey W. ; Breitwisch, Matthew J. ; Franceschini, Michele ; Garetto, Davide ; Gopalakrishnan, Kailash ; Jackson, Bryan ; Kurdi, Bülent ; Lam, Chung ; Lastras, Luis A. ; Padilla, Alvaro ; Rajendran, Bipin ; Raoux, Simone ; Shenoy, Rohit S.Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-03, Vol.28 (2), p.223-262 [Periódico revisado por pares]Texto completo disponível |
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2 |
Material Type: Livro
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Impact of basic research on technologyBehram Kursunoæglu 1922- Arnold Perlmutter 1928-; John Bardeen 1908-New York Plenum Press 1973Localização: IF - Instituto de Física (530.09 K96i )(Acessar) |
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3 |
Material Type: Artigo
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Process Technology VariationKuhn, K. J. ; Giles, M. D. ; Becher, D. ; Kolar, P. ; Kornfeld, A. ; Kotlyar, R. ; Ma, S. T. ; Maheshwari, A. ; Mudanai, S.IEEE transactions on electron devices, 2011-08, Vol.58 (8), p.2197-2208 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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4 |
Material Type: Artigo
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The 2017 terahertz science and technology roadmapDhillon, S S ; Vitiello, M S ; Linfield, E H ; Davies, A G ; Hoffmann, Matthias C ; Booske, John ; Paoloni, Claudio ; Gensch, M ; Weightman, P ; Williams, G P ; Castro-Camus, E ; Cumming, D R S ; Simoens, F ; Escorcia-Carranza, I ; Grant, J ; Lucyszyn, Stepan ; Kuwata-Gonokami, Makoto ; Konishi, Kuniaki ; Koch, Martin ; Schmuttenmaer, Charles A ; Cocker, Tyler L ; Huber, Rupert ; Markelz, A G ; Taylor, Z D ; Wallace, Vincent P ; Axel Zeitler, J ; Sibik, Juraj ; Korter, Timothy M ; Ellison, B ; Rea, S ; Goldsmith, P ; Cooper, Ken B ; Appleby, Roger ; Pardo, D ; Huggard, P G ; Krozer, V ; Shams, Haymen ; Fice, Martyn ; Renaud, Cyril ; Seeds, Alwyn ; Stöhr, Andreas ; Naftaly, Mira ; Ridler, Nick ; Clarke, Roland ; Cunningham, John E ; Johnston, Michael BJournal of physics. D, Applied physics, 2017-02, Vol.50 (4), p.43001 [Periódico revisado por pares]United States: IOP PublishingTexto completo disponível |
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5 |
Material Type: Artigo
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Nanophotonics for light detection and ranging technologyKim, Inki ; Martins, Renato Juliano ; Jang, Jaehyuck ; Badloe, Trevon ; Khadir, Samira ; Jung, Ho-Youl ; Kim, Hyeongdo ; Kim, Jongun ; Genevet, Patrice ; Rho, JunsukNature nanotechnology, 2021-05, Vol.16 (5), p.508-524 [Periódico revisado por pares]England: Nature Publishing GroupTexto completo disponível |
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6 |
Material Type: Livro
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Nanofluids: Science and TechnologyDas, Sarit K ; Choi, Stephen U ; Yu, Wenhua ; Pradeep, TNewark: John Wiley & Sons, Incorporated 2007Texto completo disponível |
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7 |
Material Type: Artigo
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300-mm Monolithic Silicon Photonics Foundry TechnologyGiewont, Ken ; Hu, Shuren ; Peng, Bo ; Rakowski, Michal ; Rauch, Stewart ; Rosenberg, Jessie C. ; Sahin, Asli ; Stobert, Ian ; Stricker, Andy ; Nummy, Karen ; Anderson, Frederick A. ; Ayala, Javier ; Barwicz, Tymon ; Bian, Yusheng ; Dezfulian, Kevin K. ; Gill, Douglas M. ; Houghton, ThomasIEEE journal of selected topics in quantum electronics, 2019-09, Vol.25 (5), p.1-11 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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8 |
Material Type: Artigo
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Ultrafast Fiber Laser TechnologyFermann, M.E. ; Hartl, I.IEEE journal of selected topics in quantum electronics, 2009-01, Vol.15 (1), p.191-206 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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9 |
Material Type: Artigo
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The Trench Power MOSFET: Part I-History, Technology, and ProspectsWilliams, Richard K. ; Darwish, Mohamed N. ; Blanchard, Richard A. ; Siemieniec, Ralf ; Rutter, Phil ; Kawaguchi, YusukeIEEE transactions on electron devices, 2017-03, Vol.64 (3), p.674-691 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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10 |
Material Type: Artigo
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Interference-Fading-Free \Phi -OTDR Based on Differential Phase Shift Pulsing TechnologyWang, Xiao ; Lu, Bin ; Wang, Zhaoyong ; Zheng, Hanrong ; Liang, Jiajing ; Li, Luchuan ; Ye, Qing ; Qu, Ronghui ; Cai, HaiwenIEEE photonics technology letters, 2019-01, Vol.31 (1), p.39-42IEEETexto completo disponível |