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1
LPP Source System Development for HVM
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Ata de Congresso
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LPP Source System Development for HVM

BRANDT, David C ; FOMENKOV, Igor V ; VASCHENKO, Georgiy O ; KHODYKIN, Oleh V ; SRIVASTAVA, Shailendra N ; AHMAD, Imtiaz ; RAJYAGURU, Chirag ; DAS, Palash ; FLEUROV, Vladimir B ; ZHANG, Kevin ; GOLICH, Daniel J ; DE DEA, Silvia ; ERSHOV, Alex I ; HOU, Richard R ; DUNSTAN, Wayne J ; WITTAK, Christian J ; BAUMGART, Peter ; ISHIHARA, Toshi ; SIMMONS, Rod D ; JACQUES, Robert N ; BERGSTEDT, Robert A ; PARTLO, William N ; MYERS, David W ; SANDSTROM, Richard L ; LA FONTAINE, Bruno ; LERCEL, Michael J ; BYKANOV, Alexander N ; BÖWERING, Norbert R

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7969

Bellingham, Wash: SPIE

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2
Advanced refractory-metal and process technology for the fabrication of x-ray masks
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Ata de Congresso
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Advanced refractory-metal and process technology for the fabrication of x-ray masks

Brooks, Cameron J ; Racette, Kenneth C ; Lercel, Michael J ; Powers, Lynn A ; Benoit, Douglas E

SPIE proceedings series, 1999, Vol.3676, p.14-23

Bellingham WA: SPIE

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3
Predicting overlay performance for electron projection lithography masks
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Ata de Congresso
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Predicting overlay performance for electron projection lithography masks

Reu, Phillip L ; Chen, Cheng-Fu ; Engelstad, Roxann L ; Lovell, Edward G ; Lercel, Michael J ; Wood, Obert R ; Mackay, R. S

SPIE proceedings series, 2002, Vol.4688, p.547-558

Bellingham WA: SPIE

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4
Reduction of image placement errors in EPL masks
Material Type:
Ata de Congresso
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Reduction of image placement errors in EPL masks

Wood, Obert R ; Reu, Phillip L ; Engelstad, Roxann L ; Lovell, Edward G ; Lercel, Michael J ; Thiel, Carey W ; Lawliss, Mark S ; Mackay, R. S

Proceedings of SPIE, 2003, Vol.5037, p.521-530

SPIE

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5
Electron-Beam-Induced Damage in Self-Assembled Monolayers
Material Type:
Artigo
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Electron-Beam-Induced Damage in Self-Assembled Monolayers

Seshadri, Kannan ; Froyd, Karl ; Parikh, Atul N ; Allara, David L ; Lercel, Michael J ; Craighead, Harold G

Journal of physical chemistry (1952), 1996-09, Vol.100 (39), p.15900-15909 [Periódico revisado por pares]

American Chemical Society

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6
Effect of reduction ratio on polarization impact for imaging
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Ata de Congresso
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Effect of reduction ratio on polarization impact for imaging

Gordon, Ronald L ; Brunner, Timothy A ; Seong, Nakgeuon ; Lercel, Michael J ; Gallatin, Gregg M

Proceedings of SPIE, 2004, Vol.5377, p.1499-1509

SPIE

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7
UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
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Ata de Congresso
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UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

Rocque, Janet M ; Lercel, Michael J ; Brooks, Cameron J ; Henry, Richard W ; Benoit, Douglas E

SPIE proceedings series, 1999, Vol.3676, p.46-55

Bellingham WA: SPIE

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8
Analysis of critical parameters for EPL mask fabrication
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Analysis of critical parameters for EPL mask fabrication

Lercel, Michael J

SPIE proceedings series, 2002, Vol.4688, p.570-582

Bellingham WA: SPIE

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9
Full-field imaging with a 157-nm scanner
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Ata de Congresso
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Full-field imaging with a 157-nm scanner

Robinson, Chris ; Seong, Nakgeuon ; Kimmel, Kurt ; Brunner, Timothy A ; Hibbs, Michael ; Lercel, Michael J ; McCafferty, Diane ; Sewell, Harry ; O'Neil, Timothy K ; Ivaldi, Juan ; Andresen, Keith

Proceedings of SPIE, 2004, Vol.5377, p.1669-1678

SPIE

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10
Utilization of optical emission endpoint in photomask dry etch processing
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Ata de Congresso
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Utilization of optical emission endpoint in photomask dry etch processing

Faure, Thomas B ; Huynh, Cuc ; Lercel, Michael J ; Smith, Adam ; Wagner, Thomas

SPIE 2002

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