Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Ata de Congresso
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LPP Source System Development for HVMBRANDT, David C ; FOMENKOV, Igor V ; VASCHENKO, Georgiy O ; KHODYKIN, Oleh V ; SRIVASTAVA, Shailendra N ; AHMAD, Imtiaz ; RAJYAGURU, Chirag ; DAS, Palash ; FLEUROV, Vladimir B ; ZHANG, Kevin ; GOLICH, Daniel J ; DE DEA, Silvia ; ERSHOV, Alex I ; HOU, Richard R ; DUNSTAN, Wayne J ; WITTAK, Christian J ; BAUMGART, Peter ; ISHIHARA, Toshi ; SIMMONS, Rod D ; JACQUES, Robert N ; BERGSTEDT, Robert A ; PARTLO, William N ; MYERS, David W ; SANDSTROM, Richard L ; LA FONTAINE, Bruno ; LERCEL, Michael J ; BYKANOV, Alexander N ; BÖWERING, Norbert RProceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7969Bellingham, Wash: SPIETexto completo disponível |
2 |
Material Type: Ata de Congresso
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Advanced refractory-metal and process technology for the fabrication of x-ray masksBrooks, Cameron J ; Racette, Kenneth C ; Lercel, Michael J ; Powers, Lynn A ; Benoit, Douglas ESPIE proceedings series, 1999, Vol.3676, p.14-23Bellingham WA: SPIETexto completo disponível |
3 |
Material Type: Ata de Congresso
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Predicting overlay performance for electron projection lithography masksReu, Phillip L ; Chen, Cheng-Fu ; Engelstad, Roxann L ; Lovell, Edward G ; Lercel, Michael J ; Wood, Obert R ; Mackay, R. SSPIE proceedings series, 2002, Vol.4688, p.547-558Bellingham WA: SPIETexto completo disponível |
4 |
Material Type: Ata de Congresso
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Reduction of image placement errors in EPL masksWood, Obert R ; Reu, Phillip L ; Engelstad, Roxann L ; Lovell, Edward G ; Lercel, Michael J ; Thiel, Carey W ; Lawliss, Mark S ; Mackay, R. SProceedings of SPIE, 2003, Vol.5037, p.521-530SPIETexto completo disponível |
5 |
Material Type: Artigo
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Electron-Beam-Induced Damage in Self-Assembled MonolayersSeshadri, Kannan ; Froyd, Karl ; Parikh, Atul N ; Allara, David L ; Lercel, Michael J ; Craighead, Harold GJournal of physical chemistry (1952), 1996-09, Vol.100 (39), p.15900-15909 [Periódico revisado por pares]American Chemical SocietyTexto completo disponível |
6 |
Material Type: Ata de Congresso
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Effect of reduction ratio on polarization impact for imagingGordon, Ronald L ; Brunner, Timothy A ; Seong, Nakgeuon ; Lercel, Michael J ; Gallatin, Gregg MProceedings of SPIE, 2004, Vol.5377, p.1499-1509SPIETexto completo disponível |
7 |
Material Type: Ata de Congresso
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UVN2-negative chemically amplified resist optimization for x-ray mask fabricationRocque, Janet M ; Lercel, Michael J ; Brooks, Cameron J ; Henry, Richard W ; Benoit, Douglas ESPIE proceedings series, 1999, Vol.3676, p.46-55Bellingham WA: SPIETexto completo disponível |
8 |
Material Type: Ata de Congresso
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Analysis of critical parameters for EPL mask fabricationLercel, Michael JSPIE proceedings series, 2002, Vol.4688, p.570-582Bellingham WA: SPIETexto completo disponível |
9 |
Material Type: Ata de Congresso
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Full-field imaging with a 157-nm scannerRobinson, Chris ; Seong, Nakgeuon ; Kimmel, Kurt ; Brunner, Timothy A ; Hibbs, Michael ; Lercel, Michael J ; McCafferty, Diane ; Sewell, Harry ; O'Neil, Timothy K ; Ivaldi, Juan ; Andresen, KeithProceedings of SPIE, 2004, Vol.5377, p.1669-1678SPIETexto completo disponível |
10 |
Material Type: Ata de Congresso
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Utilization of optical emission endpoint in photomask dry etch processingFaure, Thomas B ; Huynh, Cuc ; Lercel, Michael J ; Smith, Adam ; Wagner, ThomasSPIE 2002Texto completo disponível |