Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Guiding the deposition flux in an ionized magnetron dischargeBohlmark, J. ; Östbye, M. ; Lattemann, M. ; Ljungcrantz, H. ; Rosell, T. ; Helmersson, U.Thin solid films, 2006-12, Vol.515 (4), p.1928-1931 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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2 |
Material Type: Artigo
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Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin filmsWilke, Marcus ; Teichert, Gerd ; Gemma, Ryota ; Pundt, Astrid ; Kirchheim, Reiner ; Romanus, Henry ; Schaaf, PeterThin solid films, 2011-12, Vol.520 (5), p.1660-1667 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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3 |
Material Type: Artigo
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Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatmentLim, Jong-Won ; Ahn, Ho-Kyun ; Kim, Seong-il ; Kang, Dong-Min ; Lee, Jong-Min ; Min, Byoung-Gue ; Lee, Sang-Heung ; Yoon, Hyung-Sup ; Ju, Chull-Won ; Kim, Haecheon ; Mun, Jae-Kyoung ; Nam, Eun-Soo ; Park, Hyung-MooThin solid films, 2013-11, Vol.547, p.106-110 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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Numerical investigation for nano-particle synthesis in an RF inductively coupled plasmaShigeta, Masaya ; Watanabe, Takayuki ; Nishiyama, HideyaThin solid films, 2004-06, Vol.457 (1), p.192-200 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Fabrication of Al doped ZnO films using atmospheric pressure cold plasmaSuzaki, Yoshifumi ; Miyagawa, Hayato ; Yamaguchi, Kenzo ; Kim, Yoon-KeeThin solid films, 2012-11, Vol.522, p.324-329 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Precise etch-depth control of microlens-integrated intracavity contacted vertical-cavity surface-emitting lasers by in-situ laser reflectometry and reflectivity modelingSong, Y.M. ; Chang, K.S. ; Na, B.H. ; Yu, J.S. ; Lee, Y.T.Thin solid films, 2009-08, Vol.517 (19), p.5773-5778 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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7 |
Material Type: Artigo
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The etching characteristics of Al2O3 thin films in an inductively coupled plasmaXUE-YANG ; UM, Doo-Seung ; KIM, Chang-IlThin solid films, 2010-09, Vol.518 (22), p.6441-6445 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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8 |
Material Type: Artigo
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Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering depositionSirghi, Lucel ; Popa, Gheorghe ; Hatanaka, YoshinoriThin solid films, 2006-12, Vol.515 (4), p.1334-1339 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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9 |
Material Type: Artigo
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Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputteringPEDERSEN, K ; BØTTIGER, J ; SRIDHARAN, M ; SILLASSEN, M ; EKLUND, PThin solid films, 2010-05, Vol.518 (15), p.4294-4298 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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10 |
Material Type: Artigo
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High entropy alloy thin films deposited by magnetron sputtering of powder targetsBraeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |