Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Properties of the as related shallow acceptor level in hetero epitaxial 'ZN''SE' grown by molecular beam epitaxyY Zhang B J Skromme; M C Tamargo; S M ShibliNew York v.48, n.15, p.10885, 1993 Physical Review Letters BNew York 1993Item não circula. Consulte sua biblioteca.(Acessar) |
2 |
Material Type: Artigo
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Properties of the as related shallow acceptor level in hetero epitaxial 'ZN''SE' grown by molecular beam epitaxyY Zhang B J Skromme; M C Tamargo; S M ShibliNew York v.48, n.15, p.10885, 1993 Physical Review Letters BNew York 1993Item não circula. Consulte sua biblioteca.(Acessar) |
3 |
Material Type: Artigo
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Systematic investigation of shallow acceptor levels in 'ZN''SE'Y Zhang W Liu; B J Skromme; H Cheng; S M Shibli; M C TamargoAmsterdam v.138, p.310-7, 1994 Journal of Crystal GrowthAmsterdam 1994Item não circula. Consulte sua biblioteca.(Acessar) |
4 |
Material Type: Artigo
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Systematic investigation of shallow acceptor levels in 'ZN''SE'Y Zhang W Liu; B J Skromme; H Cheng; S M Shibli; M C TamargoAmsterdam v.138, p.310-7, 1994 Journal of Crystal GrowthAmsterdam 1994Item não circula. Consulte sua biblioteca.(Acessar) |
5 |
Material Type: Artigo
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Teaching Series and Parallel ConnectionsSkromme, B. J. ; Wong, M. L. ; Redshaw, C. J. ; O'Donnell, M. A.IEEE transactions on education, 2022-08, Vol.65 (3), p.461-470 [Periódico revisado por pares]IEEETexto completo disponível |
6 |
Material Type: Artigo
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Surface recombination and sulfide passivation of GaNMartinez, G. L. ; Curiel, M. R. ; Skromme, B. J. ; Molnar, R. J.Journal of electronic materials, 2000-03, Vol.29 (3), p.325-331 [Periódico revisado por pares]Warrendale: Springer Nature B.VTexto completo disponível |
7 |
Material Type: Artigo
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Design and optimization of junction termination extension (JTE) for 4H–SiC high voltage Schottky diodesMahajan, Atul ; Skromme, B.J.Solid-state electronics, 2005-06, Vol.49 (6), p.945-955 [Periódico revisado por pares]Oxford: Elsevier LtdTexto completo disponível |
8 |
Material Type: Artigo
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Correlation between morphological defects, electron beam-induced current imaging, and the electrical properties of 4H-SiC Schottky diodesWang, Y. ; Ali, G. N. ; Mikhov, M. K. ; Vaidyanathan, V. ; Skromme, B. J. ; Raghothamachar, B. ; Dudley, M.Journal of applied physics, 2005-01, Vol.97 (1), p.013540-013540-10 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
9 |
Material Type: Artigo
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Band-edge exciton states in AlN single crystals and epitaxial layersChen, L. ; Skromme, B. J. ; Dalmau, R. F. ; Schlesser, R. ; Sitar, Z. ; Chen, C. ; Sun, W. ; Yang, J. ; Khan, M. A. ; Nakarmi, M. L. ; Lin, J. Y. ; Jiang, H.-X.Applied physics letters, 2004-11, Vol.85 (19), p.4334-4336 [Periódico revisado por pares]Texto completo disponível |
10 |
Material Type: Artigo
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Reduction of Low-Temperature Nonlinearities in Pseudomorphic AlGaAs/InGaAs HEMTs Due to Si-Related DX CentersSkromme, B.J. ; Sasikumar, A. ; Green, B.M. ; Hartin, O.L. ; Weitzel, C.E. ; Miller, M.G.IEEE transactions on electron devices, 2010-04, Vol.57 (4), p.749-754 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |