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1
Room temperature rate coefficients for the reaction of chlorine atoms with a series of volatile methylsiloxanes (L2‐L5, D3‐D6)
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Room temperature rate coefficients for the reaction of chlorine atoms with a series of volatile methylsiloxanes (L2‐L5, D3‐D6)

Sarachandra Kumar Geetha, Anjitha ; Mikoviny, Tomas ; Piel, Felix ; Wisthaler, Armin

International journal of chemical kinetics, 2023-09, Vol.55 (9), p.570-576 [Periódico revisado por pares]

Hoboken: Wiley Subscription Services, Inc

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2
Tracing the Atom: Nuclear Legacies in Russia and Central Asia
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Livro
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Tracing the Atom: Nuclear Legacies in Russia and Central Asia

Bauer, Susanne ; Penter, Tanja Bauer, Susanne ; Penter, Tanja

United Kingdom: Routledge 2022

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3
Exploring the Molecular Dynamics of a Lipid‑A Vesicle at the Atom Level: Morphology and Permeation Mechanism
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Exploring the Molecular Dynamics of a Lipid‑A Vesicle at the Atom Level: Morphology and Permeation Mechanism

Santos, Denys E. S. ; De Nicola, Antonio ; dos Santos, Vinicius F. ; Milano, Giuseppe ; Soares, Thereza A.

The journal of physical chemistry. B, 2023-08, Vol.127 (30), p.6694-6702 [Periódico revisado por pares]

United States: American Chemical Society

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4
THE FORMATION OF IRIS DIAGNOSTICS. I. A QUINTESSENTIAL MODEL ATOM OF Mg II AND GENERAL FORMATION PROPERTIES OF THE Mg II h&k LINES
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THE FORMATION OF IRIS DIAGNOSTICS. I. A QUINTESSENTIAL MODEL ATOM OF Mg II AND GENERAL FORMATION PROPERTIES OF THE Mg II h&k LINES

LEENAARTS, J ; Pereira, T M D ; Carlsson, M ; UITENBROEK, H ; DE PONTIEU, B

The Astrophysical journal, 2013-08, Vol.772 (2), p.1-13 [Periódico revisado por pares]

University of Chicago Press

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5
Radiation tolerance of GaN: the balance between radiation-stimulated defect annealing and defect stabilization by implanted atoms
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Radiation tolerance of GaN: the balance between radiation-stimulated defect annealing and defect stabilization by implanted atoms

Titov, A I ; Karabeshkin, K V ; Struchkov, A I ; Karaseov, P A ; Azarov, A

Journal of physics. D, Applied physics, 2022-04, Vol.55 (17), p.175103 [Periódico revisado por pares]

IOP Publishing

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6
Trapping of multiple H atoms at the Ga(1) vacancy in b-Ga2O3
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Trapping of multiple H atoms at the Ga(1) vacancy in b-Ga2O3

Fowler, W. Beall ; Stavola, Michael ; Qin, Ying ; Weiser, Philip Michael

Applied physics letters, 2020 [Periódico revisado por pares]

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7
THE FORMATION OF IRIS DIAGNOSTICS. V. A QUINTESSENTIAL MODEL ATOM OF C ii AND GENERAL FORMATION PROPERTIES OF THE C ii LINES AT 133.5 nm
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THE FORMATION OF IRIS DIAGNOSTICS. V. A QUINTESSENTIAL MODEL ATOM OF C ii AND GENERAL FORMATION PROPERTIES OF THE C ii LINES AT 133.5 nm

Rathore, Bhavna ; Carlsson, Mats

The Astrophysical journal, 2015-10, Vol.811 (2), p.80 [Periódico revisado por pares]

United Kingdom: The American Astronomical Society

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8
Scalarity as a meaning atom in wohl-type particles
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Scalarity as a meaning atom in wohl-type particles

Grosz, Patrick Georg

John Benjamins Publishing Company 2022

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9
Another Torture Track for Quantum Chemistry: Reinvestigation of the Benzaldehyde Amidation by Nitrogen‐Atom Transfer from Platinum(II) and Palladium(II) Metallonitrenes
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Another Torture Track for Quantum Chemistry: Reinvestigation of the Benzaldehyde Amidation by Nitrogen‐Atom Transfer from Platinum(II) and Palladium(II) Metallonitrenes

Verplancke, Hendrik ; Diefenbach, Martin ; Lienert, Jonas N. ; Ugandi, Mihkel ; Kitsaras, Marios‐Petros ; Roemelt, Michael ; Stopkowicz, Stella ; Holthausen, Max C.

Israel journal of chemistry, 2023-08, Vol.63 (7-8), p.n/a [Periódico revisado por pares]

Haifa: Wiley Subscription Services, Inc

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10
Differences in self‐assembly features of thermoresponsive anionic triblock copolymers synthesized via one‐pot or two‐pot by atom transfer radical polymerization
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Differences in self‐assembly features of thermoresponsive anionic triblock copolymers synthesized via one‐pot or two‐pot by atom transfer radical polymerization

Motlaq, Vahid F. ; Momtazi, Leva ; Zhu, Kaizheng ; Knudsen, Kenneth D. ; Nyström, Bo

Journal of polymer science. Part B, Polymer physics, 2019-05, Vol.57 (9), p.524-534 [Periódico revisado por pares]

Hoboken, USA: John Wiley & Sons, Inc

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