Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithographyRamanathan, Muruganathan ; Darling, Seth B. ; Sumant, Anirudha V. ; Auciello, OrlandoJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-07, Vol.28 (4), p.979-983 [Periódico revisado por pares]American Vacuum SocietyTexto completo disponível |
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2 |
Material Type: Artigo
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History of atomic layer deposition and its relationship with the American Vacuum SocietyParsons, Gregory N. ; Elam, Jeffrey W. ; George, Steven M. ; Haukka, Suvi ; Jeon, Hyeongtag ; (Erwin) Kessels, W. M. M. ; Leskelä, Markku ; Poodt, Paul ; Ritala, Mikko ; Rossnagel, Steven M.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-09, Vol.31 (5) [Periódico revisado por pares]Texto completo disponível |
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3 |
Material Type: Artigo
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Effect of incubation time on preparation of continuous and flat Ru filmsFunakubo, Hiroshi ; Shiraishi, Takahisa ; Oikawa, Takahiro ; Hirano, Masaki ; Chiba, Hirokazu ; Kawano, KazuhisaJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-01, Vol.33 (1) [Periódico revisado por pares]Texto completo disponível |
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4 |
Material Type: Artigo
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Cosputtered composition-spread reproducibility established by high-throughput x-ray fluorescenceGregoire, John M. ; Dale, Darren ; Kazimirov, Alexander ; DiSalvo, Francis J. ; Bruce van Dover, R.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-09, Vol.28 (5), p.1279-1280 [Periódico revisado por pares]United States: American Vacuum SocietyTexto completo disponível |
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5 |
Material Type: Artigo
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Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamberFoerster, C. L. ; Lanni, C. ; Kanazawa, K.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001-07, Vol.19 (4), p.1652-1656 [Periódico revisado por pares]Texto completo disponível |
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6 |
Material Type: Artigo
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Reactive magnetron sputter deposition of niobium nitride filmsWong, M. S. ; Sproul, W. D. ; Chu, X. ; Barnett, S. A.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993-07, Vol.11 (4), p.1528-1533 [Periódico revisado por pares]Melville, NY: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayersChun, J.-S. ; Carlsson, J. R. A. ; Desjardins, P. ; Bergstrom, D. B. ; Petrov, I. ; Greene, J. E. ; Lavoie, C. ; Cabral, C. ; Hultman, L.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-01, Vol.19 (1), p.182-191 [Periódico revisado por pares]Texto completo disponível |
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8 |
Material Type: Artigo
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Laser‐assisted chemical vapor deposition of InN on Si(100)Bu, Y. ; Ma, L. ; Lin, M. C.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993, Vol.11 (6), p.2931-2937 [Periódico revisado por pares]Melville, NY: American Institute of PhysicsTexto completo disponível |
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9 |
Material Type: Artigo
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Interface reaction of Al/W and chemical properties of Al–W bimetallic bondingTsukada, Mitsuo ; Ohfuji, Shin‐ichiJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1995-09, Vol.13 (5), p.2525-2531 [Periódico revisado por pares]Texto completo disponível |
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10 |
Material Type: Artigo
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Field emission characteristics of SiC capped Si tip array by ion beam synthesisChen, Dihu ; Cheung, W. Y. ; Wong, S. P. ; Fung, Y. M. ; Xu, J. B. ; Wilson, I. H. ; Kwok, R. W. M.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1999-07, Vol.17 (4), p.2109-2112 [Periódico revisado por pares]Texto completo disponível |