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1 |
Material Type: Artigo
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0 6,5′-Cyclonucleosides. Reactions of 5-iodopyrimidine nucleosides with baseLipkin, D. ; Cori, C. ; Sano, M.Tetrahedron letters, 1968, Vol.9 (57), p.5993-5996 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
2 |
Material Type: Ata de Congresso
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0.11 /spl mu/m fully-depleted SOI CMOS devices with 26 nm silicon layer fabricated by bulk compatible processKomatsu, H. ; Nakayama, H. ; Koyama, K. ; Matsumoto, K. ; Ohno, T. ; Takeshita, K.2001 IEEE International SOI Conference. Proceedings (Cat. No.01CH37207), 2001, p.23-24 [Periódico revisado por pares]IEEETexto completo disponível |
3 |
Material Type: Artigo
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0.1W GM冷凍機によるトップローディング型1K冷凍機の開発高山, 榛佳 ; 西岡, 孝 ; 宮本, 悟 ; 門, 恒夫日本物理学会講演概要集, 2019, pp.1931-1931一般社団法人 日本物理学会Sem texto completo |
4 |
Material Type: Artigo
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0.3 nm-high atomic-step patterning onto large PMMA surface by thermal nanoimprintTan, Geng ; Inoue, Naoya ; Funabasama, Tomoyuki ; Mita, Masahiro ; Okuda, Norimichi ; Mori, Junichi ; Koyama, Koji ; Nakagawa, Masaru ; Matsuda, Akifumi ; Yoshimoto, MamoruJSAP Annual Meetings Extended Abstracts, 2014/03/03, pp.1505-1505The Japan Society of Applied PhysicsSem texto completo |
5 |
Material Type: Artigo
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0.43 THz emission from high- T c superconducting emitters optimized at 77 KMinami, H ; Watanabe, C ; Kashiwagi, T ; Yamamoto, T ; Kadowaki, K ; Klemm, R AJournal of physics. Condensed matter, 2016-01, Vol.28 (2), p.25701 [Periódico revisado por pares]Texto completo disponível |
6 |
Material Type: Artigo
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0.43 THz emission from high-Tc superconducting emitters optimized at 77 KMinami, H ; Watanabe, C ; Kashiwagi, T ; Yamamoto, T ; Kadowaki, K ; Klemm, R AJournal of physics. Condensed matter, 2015-12, Vol.28 (2) [Periódico revisado por pares]IOP PublishingTexto completo disponível |
7 |
Material Type: Artigo
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0.6nm-EOT high-k gate stacks with HfSiO x interfacial layer grown by solid-phase reaction between HfO 2 and Si substrateOgawa, A. ; Iwamoto, K. ; Ota, H. ; Morita, Y. ; Ikeda, M. ; Nabatame, T. ; Toriumi, A.Microelectronic engineering, 2007, Vol.84 (9), p.1861-1864 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
8 |
Material Type: Artigo
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0.6nm-EOT high-k gate stacks with HfSiOx interfacial layer grown by solid-phase reaction between HfO2 and Si substrateOGAWA, A ; IWAMOTO, K ; OTA, H ; MORITA, Y ; IKEDA, M ; NABATAME, T ; TORIUMI, AMicroelectronic engineering, 2007-09, Vol.84 (9-10), p.1861-1864 [Periódico revisado por pares]Amsterdam: Elsevier ScienceTexto completo disponível |
9 |
Material Type: Artigo
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0.85 µm bottom-emitting vertical-cavity surface-emitting laser diode arrays grown on AlGaAs substratesOhiso, Y. ; Kurokawa, T. ; Kohama, Y.Electronics letters, 1994-08, Vol.30 (17), p.1406-1407, Article 1406 [Periódico revisado por pares]Sem texto completo |
10 |
Material Type: Artigo
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A 0.23 pJ 11.05-bit ENOB 125-MS/s pipelined ADC in a 0.18 μm CMOS processProject supported by the Foundation of Shanghai Municipal Commission of Economy and Informatization (No. 130311)Wang, Yong ; Zhang, Jianyun ; Yin, Rui ; Zhao, Yuhang ; Zhang, WeiJournal of semiconductors, 2015-05, Vol.36 (5) [Periódico revisado por pares]Chinese Institute of ElectronicsTexto completo disponível |