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Refinado por: assunto: Exact Sciences And Technology remover
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Investigation of carbon plasma species emission at relatively high KrF laser fluences in nitrogen ambient
Investigation of carbon plasma species emission at relatively high KrF laser fluences in nitrogen ambient
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Investigation of carbon plasma species emission at relatively high KrF laser fluences in nitrogen ambient

Abdelli-Messaci, S. ; Kerdja, T. ; Bendib, A. ; Aberkane, S.M. ; Lafane, S. ; Malek, S.

Applied surface science, 2005-12, Vol.252 (5), p.2012-2020 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Rapid survey analysis of polymeric materials by laser-induced plasma emission spectrometry
Rapid survey analysis of polymeric materials by laser-induced plasma emission spectrometry
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Rapid survey analysis of polymeric materials by laser-induced plasma emission spectrometry

ANDERSSON, D. R ; MCLEOD, C. W ; SMITH, T. A

Journal of analytical atomic spectrometry, 1994, Vol.9 (2), p.67-72 [Periódico revisado por pares]

Cambridge: Royal Society of Chemistry

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3
Classification of polymers by determining of C1:C2:CN:H:N:O ratios by laser-induced plasma spectroscopy (LIPS)
Classification of polymers by determining of C1:C2:CN:H:N:O ratios by laser-induced plasma spectroscopy (LIPS)
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Classification of polymers by determining of C1:C2:CN:H:N:O ratios by laser-induced plasma spectroscopy (LIPS)

ANZANO, Jesus ; LASHERAS, Roberto-Jesus ; BONILLA, Beatriz ; CASAS, Justiniano

Polymer testing, 2008-09, Vol.27 (6), p.705-710 [Periódico revisado por pares]

Kindlington: Elsevier

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4
Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source
Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source
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Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source

Barkusky, Frank ; Bayer, Armin ; Peth, Christian ; Mann, Klaus

Proceedings of SPIE, the International Society for Optical Engineering, 2008, Vol.6879, p.68791M-68791M-10

Bellingham, Wash: SPIE

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5
Compact EUV source and Schwarzschild objective for modification and ablation of various materials
Compact EUV source and Schwarzschild objective for modification and ablation of various materials
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Compact EUV source and Schwarzschild objective for modification and ablation of various materials

Barkusky, Frank ; Bayer, Armin ; Peth, Christian ; Töttger, Holger ; Mann, Klaus

Proceedings of SPIE, the International Society for Optical Engineering, 2007, Vol.6586, p.65860B-65860B-12

Bellingham, Wash: SPIE

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6
Influence of the growth conditions of AlN and GaN films by reactive laser ablation
Influence of the growth conditions of AlN and GaN films by reactive laser ablation
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Influence of the growth conditions of AlN and GaN films by reactive laser ablation

Basillais, Armelle ; Boulmer-Leborgne, Chantal ; Mathias, Jacky ; Perrière, Jacques

Applied surface science, 2002-01, Vol.186 (1), p.416-422 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Laser ablation of organic materials for discrimination of bacteria in an inorganic background
Laser ablation of organic materials for discrimination of bacteria in an inorganic background
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Laser ablation of organic materials for discrimination of bacteria in an inorganic background

Baudelet, Matthieu ; Boueri, Myriam ; Yu, Jin ; Mao, Xianglei ; Mao, Samuel S ; Russo, Richard

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7214, p.72140J-72140J-10

Bellingham, Wash: SPIE

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8
Correlation between early-stage expansion and spectral emission of a nanosecond laser-induced plasma from organic material
Correlation between early-stage expansion and spectral emission of a nanosecond laser-induced plasma from organic material
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Correlation between early-stage expansion and spectral emission of a nanosecond laser-induced plasma from organic material

Baudelet, Matthieu ; Boueri, Myriam ; Yu, Jin ; Mao, Xianglei ; Russo, Richard E

Proceedings of SPIE, the International Society for Optical Engineering, 2008, Vol.7005, p.70050J-70050J-8

Bellingham, Wash: SPIE

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9
Compact EUV source and optics for direct structuring of surfaces
Compact EUV source and optics for direct structuring of surfaces
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Compact EUV source and optics for direct structuring of surfaces

Bayer, Armin ; Barkusky, Frank ; Peth, Christian ; Töttger, Holger ; Mann, Klaus

Proceedings of SPIE, the International Society for Optical Engineering, 2007, Vol.6458, p.64580Z-64580Z-12

Bellingham WA: SPIE

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10
Compact EUV source and optics for applications apart from lithography
Compact EUV source and optics for applications apart from lithography
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Compact EUV source and optics for applications apart from lithography

Bayer, Armin ; Barkusky, Frank ; Peth, Christian ; Töttger, Holger ; Mann, Klaus

Proceedings of SPIE, the International Society for Optical Engineering, 2006, Vol.6317, p.631706-631706-12

Bellingham, Wash: SPIE

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