Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Leaky mode analysis of luminescent thin films: The case of ZnO on sapphireAad, Roy ; Divay, Laurent ; Bruyant, Aurelien ; Blaize, Sylvain ; Couteau, Christophe ; Rogers, David J. ; Lerondel, GillesJournal of applied physics, 2012-09, Vol.112 (6) [Periódico revisado por pares]American Institute of PhysicsTexto completo disponível |
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2 |
Material Type: Artigo
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WC/ a -C nanocomposite thin films: Optical and electrical propertiesAbad, M. D. ; Sánchez-López, J. C. ; Cusnir, N. ; Sanjines, R.Journal of applied physics, 2009-02, Vol.105 (3), p.033510-033510-6 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
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3 |
Material Type: Artigo
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Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction studyAbadias, G. ; Debelle, A. ; Michel, A. ; Jaouen, C. ; Martin, F. ; Pacaud, J.Journal of applied physics, 2010-01, Vol.107 (2), p.023515-023515-10 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
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4 |
Material Type: Artigo
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Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputteringAbadias, G. ; Tse, Y. Y. ; Guérin, Ph ; Pelosin, V.Journal of applied physics, 2006-06, Vol.99 (11), p.113519-113519-13 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
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5 |
Material Type: Artigo
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Hydrogen softening and optical transparency in Si-incorporated hydrogenated amorphous carbon filmsAbbas, G. A. ; Papakonstantinou, P. ; McLaughlin, J. A. ; Weijers-Dall, T. D. M. ; Elliman, R. G. ; Filik, J.Journal of applied physics, 2005-11, Vol.98 (10), p.103505-103505-6 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
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6 |
Material Type: Artigo
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Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor depositionAbbasi-Firouzjah, M. ; Shokri, B.Journal of applied physics, 2013-12, Vol.114 (21) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Passivation of CdTe/MgCdTe double heterostructure by dielectric thin films deposited using atomic layer depositionAbbasi, Haris Naeem ; Qi, Xin ; Gong, Jiarui ; Ju, Zheng ; Min, Seunghwan ; Zhang, Yong-Hang ; Ma, ZhenqiangJournal of applied physics, 2023-10, Vol.134 (13) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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8 |
Material Type: Artigo
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Optical modeling and electrical properties of cadmium oxide nanofilms: Developing a meta–heuristic calculation process modelAbdolahzadeh Ziabari, Ali ; Refahi Sheikhani, A. H. ; Nezafat, Reza Vatani ; Haghighidoust, Kasra MonsefJournal of applied physics, 2015-04, Vol.117 (13) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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9 |
Material Type: Artigo
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Effect of atomic layer deposited Al2O3:ZnO alloys on thin-film silicon photovoltaic devicesAbdul Hadi, Sabina ; Dushaq, Ghada ; Nayfeh, AmmarJournal of applied physics, 2017-12, Vol.122 (24) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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10 |
Material Type: Artigo
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Effect of annealing and hydrogen plasma treatment on the luminescence and persistent photoconductivity of polycrystalline ZnO filmsAbdullin, Kh. A. ; Cicero, G. ; Gritsenko, L. V. ; Kumekov, S. E. ; Markhabaeva, A. A.Journal of applied physics, 2017-06, Vol.121 (24) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |