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1
The effect of hard nitridation on Al2O3 using a radio frequency operated plasma cell
The effect of hard nitridation on Al2O3 using a radio frequency operated plasma cell
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The effect of hard nitridation on Al2O3 using a radio frequency operated plasma cell

AGNARSSON, B ; QI, B ; GÖTHELID, M ; OLAFSSON, S ; GISLASON, H. P

Thin solid films, 2011-09, Vol.519 (22), p.7796-7802 [Periódico revisado por pares]

Amsterdam: Elsevier

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2
Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target
Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target
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Effect of liquid level and laser power on the formation of spherical alumina nanoparticles by nanosecond laser ablation of alumina target

Al-Mamun, Sharif Abdullah ; Nakajima, Reiko ; Ishigaki, Takamasa

Thin solid films, 2012-11, Vol.523, p.46-51 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Guiding the deposition flux in an ionized magnetron discharge
Guiding the deposition flux in an ionized magnetron discharge
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Guiding the deposition flux in an ionized magnetron discharge

Bohlmark, J. ; Östbye, M. ; Lattemann, M. ; Ljungcrantz, H. ; Rosell, T. ; Helmersson, U.

Thin solid films, 2006-12, Vol.515 (4), p.1928-1931 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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4
High entropy alloy thin films deposited by magnetron sputtering of powder targets
High entropy alloy thin films deposited by magnetron sputtering of powder targets
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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Braeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.

Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]

Elsevier B.V

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5
Microstructure of plasma-sprayed NiAl alloy coating on mild steel
Microstructure of plasma-sprayed NiAl alloy coating on mild steel
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Microstructure of plasma-sprayed NiAl alloy coating on mild steel

Chen, H.C. ; Pfender, E.

Thin solid films, 1996-07, Vol.280 (1), p.188-198 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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6
Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers
Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers
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Epitaxial growth of non-polar a-plane AlN films by low temperature sputtering using ZnO buffer layers

Chen, Hou-Guang ; Jian, Sheng-Rui ; Kao, Hui-Ling ; Chen, Meei-Ru ; Huang, Gou-Zhi

Thin solid films, 2011-05, Vol.519 (15), p.5090-5094 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates
Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates
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Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates

Ebil, Ozgenc ; Aparicio, Roger ; Birkmire, Robert

Thin solid films, 2010-10, Vol.519 (1), p.178-183 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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8
Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum
Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum
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Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum

Ji, H. ; Côté, A. ; Koshel, D. ; Terreault, B. ; Abel, G. ; Ducharme, P. ; Ross, G. ; Savoie, S. ; Gagné, M.

Thin solid films, 2002-02, Vol.405 (1), p.104-108 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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9
Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering
Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering
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Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering

Jung, S.J. ; Han, Y.H. ; Koo, B.M. ; Lee, J.J. ; Joo, J.H.

Thin solid films, 2005-03, Vol.475 (1-2), p.275-278 [Periódico revisado por pares]

Elsevier B.V

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10
The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure
The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure
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The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure

Kim, D.W. ; Jung, M.Y. ; Choi, Seong S. ; Kim, J.W. ; Boo, J.H.

Thin solid films, 2005-03, Vol.475 (1-2), p.81-85 [Periódico revisado por pares]

Elsevier B.V

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