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Characterization of mixed zinc-oxidized zinc thin films deposited by a cold remote nitrogen plasma
Characterization of mixed zinc-oxidized zinc thin films deposited by a cold remote nitrogen plasma
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Characterization of mixed zinc-oxidized zinc thin films deposited by a cold remote nitrogen plasma

Mutel, B. ; Taleb, A.Ben ; Dessaux, O. ; Goudmand, P. ; Gengembre, L. ; Grimblot, J.

Thin solid films, 1995-10, Vol.266 (2), p.119-128 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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2
Microstructure of plasma-sprayed NiAl alloy coating on mild steel
Microstructure of plasma-sprayed NiAl alloy coating on mild steel
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Microstructure of plasma-sprayed NiAl alloy coating on mild steel

Chen, H.C. ; Pfender, E.

Thin solid films, 1996-07, Vol.280 (1), p.188-198 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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3
Titanium-containing hydrofluoric acid pretreatment for aluminum chemical vapor deposition
Titanium-containing hydrofluoric acid pretreatment for aluminum chemical vapor deposition
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Titanium-containing hydrofluoric acid pretreatment for aluminum chemical vapor deposition

Sugai, Kazumi ; Okabayashi, Hidekazu ; Kishida, Shunji ; Shinzawa, Tsutomu

Thin solid films, 1996-07, Vol.280 (1), p.142-146 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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4
Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum
Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum
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Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum

Ji, H. ; Côté, A. ; Koshel, D. ; Terreault, B. ; Abel, G. ; Ducharme, P. ; Ross, G. ; Savoie, S. ; Gagné, M.

Thin solid films, 2002-02, Vol.405 (1), p.104-108 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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5
Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma
Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma
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Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma

Shigeta, Masaya ; Watanabe, Takayuki ; Nishiyama, Hideya

Thin solid films, 2004-06, Vol.457 (1), p.192-200 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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6
The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure
The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure
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The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure

Kim, D.W. ; Jung, M.Y. ; Choi, Seong S. ; Kim, J.W. ; Boo, J.H.

Thin solid films, 2005-03, Vol.475 (1-2), p.81-85 [Periódico revisado por pares]

Elsevier B.V

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7
Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering
Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering
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Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering

Jung, S.J. ; Han, Y.H. ; Koo, B.M. ; Lee, J.J. ; Joo, J.H.

Thin solid films, 2005-03, Vol.475 (1-2), p.275-278 [Periódico revisado por pares]

Elsevier B.V

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8
Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition
Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition
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Fabrication of SnS2/SnS heterojunction thin film diodes by plasma-enhanced chemical vapor deposition

Sánchez-Juárez, A. ; Tiburcio-Silver, A. ; Ortiz, A.

Thin solid films, 2005-06, Vol.480-481 (Complete), p.452-456 [Periódico revisado por pares]

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9
Enhancement of the c-axis texture of aluminum nitride by an inductively coupled plasma reactive sputtering process
Enhancement of the c-axis texture of aluminum nitride by an inductively coupled plasma reactive sputtering process
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Enhancement of the c-axis texture of aluminum nitride by an inductively coupled plasma reactive sputtering process

Yeh, C.-M. ; Chen, C.H. ; Gan, J.-Y. ; Kou, C.S. ; Hwang, J.

Thin solid films, 2005-07, Vol.483 (1), p.6-9 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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10
Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition
Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition
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Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition

Wiest, F. ; Capodieci, V. ; Blank, O. ; Gutsche, M. ; Schulze, J. ; Eisele, I. ; Matusche, J. ; Schmidt, U.I.

Thin solid films, 2006-02, Vol.496 (2), p.240-246 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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