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Microjet burners for molecular‐beam sources and combustion studies
Microjet burners for molecular‐beam sources and combustion studies
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Microjet burners for molecular‐beam sources and combustion studies

Groeger, Wolfgang ; Fenn, John B.

Review of scientific instruments, 1988-09, Vol.59 (9), p.1971-1979 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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2
Process uniformity and slip dislocation patterns in linearly ramped-temperature transient rapid thermal processing of silicon
Process uniformity and slip dislocation patterns in linearly ramped-temperature transient rapid thermal processing of silicon
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Process uniformity and slip dislocation patterns in linearly ramped-temperature transient rapid thermal processing of silicon

Moslehi, M.M.

IEEE transactions on semiconductor manufacturing, 1989-11, Vol.2 (4), p.130-140 [Periódico revisado por pares]

IEEE

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3
Nature of active sites in the oxidative coupling of methane to ethane over Li/MgO catalysts
Nature of active sites in the oxidative coupling of methane to ethane over Li/MgO catalysts
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Nature of active sites in the oxidative coupling of methane to ethane over Li/MgO catalysts

Wu, Ming‐Cheng ; Truong, Charles M. ; Coulter, Kent ; Goodman, D. Wayne

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993-07, Vol.11 (4), p.2174-2178 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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4
Design and construction of a circulating fluidized bed combustion facility for use in studying the thermal remediation of wastes
Design and construction of a circulating fluidized bed combustion facility for use in studying the thermal remediation of wastes
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Design and construction of a circulating fluidized bed combustion facility for use in studying the thermal remediation of wastes

Rink, Karl K. ; Kozinski, Janusz A. ; Lighty, JoAnn S. ; Lu, Quing

Review of scientific instruments, 1994-08, Vol.65 (8), p.2704-2713 [Periódico revisado por pares]

United States

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5
Correlation between reliability and oxidation temperature for ultra-dry ultrathin silicon oxide films
Correlation between reliability and oxidation temperature for ultra-dry ultrathin silicon oxide films
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Correlation between reliability and oxidation temperature for ultra-dry ultrathin silicon oxide films

YAMADA, H

Journal of electronic materials, 1999-04, Vol.28 (4), p.377-384 [Periódico revisado por pares]

New York, NY: Institute of Electrical and Electronics Engineers

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6
Plasma-assisted reduction of carbon dioxide in the gas phase
Plasma-assisted reduction of carbon dioxide in the gas phase
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Plasma-assisted reduction of carbon dioxide in the gas phase

Maya, L.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-01, Vol.18 (1), p.285-287 [Periódico revisado por pares]

United States

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7
Transfer etching of bilayer resists in oxygen-based plasmas
Transfer etching of bilayer resists in oxygen-based plasmas
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Transfer etching of bilayer resists in oxygen-based plasmas

Mahorowala, A. P. ; Babich, K. ; Lin, Q. ; Medeiros, D. R. ; Petrillo, K. ; Simons, J. ; Angelopoulos, M. ; Sooriyakumaran, R. ; Hofer, D. ; Reynolds, G. W. ; Taylor, J. W.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000-07, Vol.18 (4), p.1411-1419 [Periódico revisado por pares]

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8
High-temperature oxidation of industrial FeCrMo steel
High-temperature oxidation of industrial FeCrMo steel
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High-temperature oxidation of industrial FeCrMo steel

Greeff, A. P. ; Louw, C. W. ; Swart, H. C.

Surface and interface analysis, 2000-08, Vol.30 (1), p.120-123 [Periódico revisado por pares]

Chichester, UK: John Wiley & Sons, Ltd

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9
Characteristics of ozonizer using pulsed power
Characteristics of ozonizer using pulsed power
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Characteristics of ozonizer using pulsed power

Namihira, T. ; Shinozaki, K. ; Katsuki, S. ; Hackam, R. ; Akiyama, H. ; Sakugawa, T.

PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference. Digest of Papers (Cat. No.01CH37251), 2001, Vol.2, p.1090-1093 vol.2

IEEE

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10
Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics
Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics
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Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics

Suh, S.-M. ; Zachariah, M. R. ; Girshick, S. L.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-05, Vol.19 (3), p.940-951 [Periódico revisado por pares]

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