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Refinado por: assunto: Physics remover Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films remover
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Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements
Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements
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Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements

Kusano, Eiji

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-03, Vol.42 (2) [Periódico revisado por pares]

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2
Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor
Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor
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Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor

Jäckel, Linda ; Zienert, Andreas ; Zeun, Annekathrin ; Seidel, Anna-Sophie ; Schuster, Jörg

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-03, Vol.42 (2) [Periódico revisado por pares]

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3
Statistical analysis of pulsed spark discharges in water: Effects of gap distance, electrode material, and voltage polarity on discharge characteristics
Statistical analysis of pulsed spark discharges in water: Effects of gap distance, electrode material, and voltage polarity on discharge characteristics
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Statistical analysis of pulsed spark discharges in water: Effects of gap distance, electrode material, and voltage polarity on discharge characteristics

Dorval, Audren ; Geraud, Korentin ; Valensi, Flavien ; Hamdan, Ahmad

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-07, Vol.40 (4) [Periódico revisado por pares]

American Vacuum Society

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4
Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/Si
Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/Si
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Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/Si

Kitajima, Takeshi ; Kage, Ryosuke ; Nakano, Toshiki

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-11, Vol.36 (6) [Periódico revisado por pares]

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5
Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/Si
Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/Si
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Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/Si

Kitajima, Takeshi ; Kage, Ryosuke ; Nakano, Toshiki

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-09, Vol.36 (5) [Periódico revisado por pares]

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6
Low temperature plasma enhanced deposition of GaP films on Si substrate
Low temperature plasma enhanced deposition of GaP films on Si substrate
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Low temperature plasma enhanced deposition of GaP films on Si substrate

Gudovskikh, Alexander S. ; Morozov, Ivan A. ; Uvarov, Alexander V. ; Kudryashov, Dmitriy A. ; Nikitina, Ekaterina V. ; Bukatin, Anton S. ; Nevedomskiy, Vladimir N. ; Kleider, Jean-Paul

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-03, Vol.36 (2) [Periódico revisado por pares]

American Vacuum Society

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7
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
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Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Sprenger, Jaclyn K. ; Sun, Huaxing ; Cavanagh, Andrew S. ; George, Steven M.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1) [Periódico revisado por pares]

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8
Transition between stable hydrophilization and fast etching/hydrophilization of poly(methyl)methacrylate polymer using a novel atmospheric pressure dielectric barrier discharge source
Transition between stable hydrophilization and fast etching/hydrophilization of poly(methyl)methacrylate polymer using a novel atmospheric pressure dielectric barrier discharge source
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Transition between stable hydrophilization and fast etching/hydrophilization of poly(methyl)methacrylate polymer using a novel atmospheric pressure dielectric barrier discharge source

Dimitrakellis, Panagiotis ; Gogolides, Evangelos ; Zeniou, Angelos ; Awsiuk, Kamil ; Rysz, Jakub ; Marzec, Mateusz M.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-07, Vol.35 (4) [Periódico revisado por pares]

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9
Tobacco mosaic virus: A biological building block for micro/nano/bio systems
Tobacco mosaic virus: A biological building block for micro/nano/bio systems
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Tobacco mosaic virus: A biological building block for micro/nano/bio systems

Fan, Xiao Z. ; Pomerantseva, Ekaterina ; Gnerlich, Markus ; Brown, Adam ; Gerasopoulos, Konstantinos ; McCarthy, Matthew ; Culver, James ; Ghodssi, Reza

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-09, Vol.31 (5) [Periódico revisado por pares]

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10
Effect of surface material and roughness on conductance of channel between parallel disks at molecular flow
Effect of surface material and roughness on conductance of channel between parallel disks at molecular flow
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Effect of surface material and roughness on conductance of channel between parallel disks at molecular flow

Yoshida, Hajime ; Shiro, Masanori ; Arai, Kenta ; Hirata, Masahiro ; Akimichi, Hitoshi

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-07, Vol.28 (4), p.937-941 [Periódico revisado por pares]

American Vacuum Society

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