Fluorine containing plasma etching surface chemical characterization by coulometric reduction
Hugo Antonio Vilca-Melendez Ronaldo Ruas; Patrick Bernard Verdonck 1958-; Idalina Vieira Aoki 1955-; Meeting of the International Society of Electrochemistry (54. 2003 São Pedro)
54 th ISE Meeting book of abstracts. São Carlos : ISE, 2003.
São Pedro 2003
Item não circula. Consulte sua biblioteca.(Acessar)