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Material Type: Artigo
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Effect of Oxygen for Ultra-Thin La2O3 Film DepositionTachi, Kiichi ; Iwai, H. ; Hattori, Takeo ; Sugii, Nobuyuki ; Tsutsui, Kazuo ; Ahemt, Parhat ; Kakushima, KuniyukiMeeting abstracts (Electrochemical Society), 2006-06, Vol.MA2006-02 (22), p.1128-1128Texto completo disponível |
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Material Type: Ata de Congresso
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Effect of Oxygen for Ultra-Thin La2O3 Film DepositionTachi, Kiichi ; Iwai, H. ; Hattori, Takeo ; Sugii, Nobuyuki ; Tsutsui, Kazuo ; Ahemt, Parhat ; Kakushima, KuniyukiECS transactions, 2006, Vol.3 (3), p.425-434Texto completo disponível |
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Material Type: Ata de Congresso
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Depth profiling of chemical bonding states of impurity atoms and their correlation with electrical activity in Si shallow junctionsTsutsui, Kazuo ; Hoshino, Norifumi ; Nakagawa, Yasumasa ; Tanaka, Masaoki ; Nohira, Hiroshi ; Kakushima, Kuniyuki ; Ahemt, Parhat ; Sasaki, Yuichiro ; Mizuno, Bunji ; Hattori, Takeo ; Iwai, Hiroshi2010 International Workshop on Junction Technology Extended Abstracts, 2010, p.1-4IEEETexto completo disponível |
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Material Type: Artigo
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CVD法によるCeOX絶縁膜の作製と特性評価幸田, みゆき ; 小澤, 健児 ; 角嶋, 邦之 ; 岩井, 洋 ; 卜部, 友二 ; 安田, 哲二応用物理学会学術講演会講演予稿集, 2010/08/30, pp.2495-2495公益社団法人 応用物理学会Sem texto completo |