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1
Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstruture
Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstruture
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstruture

G Capote R Prioli; P. M Jardim; Antonio Ricardo Zanatta; L. G Jacobsohn; F. L Freire Junior; International Conference on Amorphous and Microcrystalline Semiconductors : Science and Technology - ICAMS (20. 2003 Campos do Jordão)

Abstract Book and Final Program Campinas, 2003

Campinas 2003

Localização: IFSC - Inst. Física de São Carlos    (PROD009411 ) e outros locais(Acessar)

2
Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstructure
Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstructure
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Amorphous hydrogenated carbon films deposited by PECVD influence of the substrate temperature on film growth and microstructure

G. Capote R Prioli; P. M Jardim; Antonio Ricardo Zanatta; L. G Jacobsohn; F. L Freire Junior; International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (20. 2003 Campos do Jordão)

Journal of Non-Crystalline Solids Amsterdam v. 338/340, p. 503-508, Jun. 2004

Amsterdam Elsevier Science 2004

Localização: IFSC - Inst. Física de São Carlos    (PROD009871 ) e outros locais(Acessar)

3
Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing
Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing
Material Type:
Artigo 		Adicionar ao Meu Espaço

Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing

L. G. Jacobsohn Antonio Ricardo Zanatta; M Nastasi

Journal of Vacuum Science and Technolohy B Melville v. 22, n. 4, p. 1669-1671, Jul./Aug. 2004

Melville 2004

Localização: IFSC - Inst. Física de São Carlos    (PROD010215 )(Acessar)

4
Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing
Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing
Material Type:
Artigo 		Adicionar ao Meu Espaço

Formation of silicon nanocrystals in Si'O IND.2' by oxireduction reaction indeced by impurity implantation and annealing

L. G. Jacobsohn Antonio Ricardo Zanatta; M Nastasi

Journal of Vacuum Science and Technolohy B Melville v. 22, n. 4, p. 1669-1671, Jul./Aug. 2004

Melville 2004

Localização: IFSC - Inst. Física de São Carlos    (PROD010215 )(Acessar)

5
A new pathway for Si nanocrystal formation oxi-reduction induced by impurity implantation
A new pathway for Si nanocrystal formation oxi-reduction induced by impurity implantation
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

A new pathway for Si nanocrystal formation oxi-reduction induced by impurity implantation

L. G. Jacobsohn Antonio Ricardo Zanatta; J. K Lee; D. W Cooke; B. L Bennett; C. J Wetteland; J. R Tesmer; M Nastasi; MRS Spring Meeting (2003 San Francisco); Symposium T: Nanostructuring Materials with Energetic Beams (2003 San Francisco)

Materials Research Society Symposium Proceedings Warrendale : Materials Research Society - MRS, 2003 v. 777

Warrendale Materials Research Society - MRS 2003

Localização: IFSC - Inst. Física de São Carlos    (PROD009639 ) e outros locais(Acessar)

6
Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar
Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar
Material Type:
Artigo 		Adicionar ao Meu Espaço

Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar

L G Jacobsohn G Capote; N C Cruz; Antonio Ricardo Zanatta; F L Freire Junior

Thin Solid Films Lausanne : Elsevier Science v.419, n.1-2, p.46-53, Nov. 2002

Lausanne 2002

Localização: IFSC - Inst. Física de São Carlos    (PROD008361 )(Acessar)

7
Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar
Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar
Material Type:
Artigo 		Adicionar ao Meu Espaço

Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar

L G Jacobsohn G Capote; N C Cruz; Antonio Ricardo Zanatta; F L Freire Junior

Thin Solid Films Lausanne : Elsevier Science v.419, n.1-2, p.46-53, Nov. 2002

Lausanne 2002

Localização: IFSC - Inst. Física de São Carlos    (PROD008361 )(Acessar)

8
Thermoluminescence of UV-irradiated α-Al2O3:C,Mg
Thermoluminescence of UV-irradiated α-Al2O3:C,Mg
Material Type:
Artigo 		Adicionar ao Meu Espaço

Thermoluminescence of UV-irradiated α-Al2O3:C,Mg

N. M. Trindade M. G Magalhães; M. C. S Nunes; E. M Yoshimura; L. G Jacobsohn

Journal of Luminescence Amsterdam: Elsevier, 2020 v. 223, número do artigo: 117195

Amsterdam 2020

Item não circula. Consulte sua biblioteca.(Acessar)

9
OSL response of α-Al2O3:C, Mg exposed to beta and UVC radiation A comparative investigation
OSL response of α-Al2O3:C, Mg exposed to beta and UVC radiation A comparative investigation
Material Type:
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OSL response of α-Al2O3:C, Mg exposed to beta and UVC radiation A comparative investigation

J. M. Munoz Luan Santos Lima; Elisabeth Yoshimura; L. G Jacobsohn; Neilo Marcos Trindade

Journal of Luminescence Amsterdam: Elsevier, 2021 v. 236, número do artigo: 118058, online, 19 março 2021

Amsterdam 2021

Item não circula. Consulte sua biblioteca.(Acessar)

10
The kinetic parameters of the main thermoluminescence glow peak of Al2O3:C,Mg A critical evaluation of different analytical methods
The kinetic parameters of the main thermoluminescence glow peak of Al2O3:C,Mg A critical evaluation of different analytical methods
Material Type:
Artigo 		Adicionar ao Meu Espaço

The kinetic parameters of the main thermoluminescence glow peak of Al2O3:C,Mg A critical evaluation of different analytical methods

J. M. Munoz Elisabeth Mateus Yoshimura; M. L Chithambo; L. G Jacobsohn; Neilo Marcos Trindade

Journal of Luminescence Amsterdam: ELsevier, 2022 v. 247, número do artigo: 118848, online

Amsterdam 2022

Item não circula. Consulte sua biblioteca.(Acessar)

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Deste Autor:

  1. Jacobsohn, L
  2. de Camargo, A
  3. Galleani, G
  4. Lodi, T
  5. Trindade, N

Neste Assunto:

  1. Science & Technology
  2. Physical Sciences
  3. Technology
  4. Physics
  5. Materials Science

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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