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Resultados de 1 a 10 de 108  para Produção Intelectual da USP

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1
Oxygen plasma etching mechanisms of resist
Oxygen plasma etching mechanisms of resist
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Oxygen plasma etching mechanisms of resist

Patrick Bernard Verdonck 1958- International Symposium on Microelectronics Technology and Devices SBMICRO (19. 2004 Porto Galinhas)

Santos, E. J. B.; Ribas, R. P.; Swart, J. eds Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03 Pennington : The Electrochemical Society, 2004

Pennington The Electrochemical Society 2004

Item não circula. Consulte sua biblioteca.(Acessar)

2
A study of total series resistance and effective channel length comparing SOI nMOSFET and GC SOI nMOSFET in saturation region
A study of total series resistance and effective channel length comparing SOI nMOSFET and GC SOI nMOSFET in saturation region
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

A study of total series resistance and effective channel length comparing SOI nMOSFET and GC SOI nMOSFET in saturation region

Galba Falce de Almeida João Antonio Martino 1959-; International Symposium on Microelectronics Technology and Devices SBMICRO (20. 2005 Florianópolis)

Claeys, C.; Swart, J. W.; Morimoto, N. I.; Verdonck, P., eds. Microelectronics Technology and Devices SBMICRO 2005 Pennington : The Electrochemical Society, 2005. Proceedings v. 2005-08

Pennington The Electrochemical Society 2005

Item não circula. Consulte sua biblioteca.(Acessar)

3
Temperature influences on the drain leakage current behavior in graded-channel SOI nMOSFETs
Temperature influences on the drain leakage current behavior in graded-channel SOI nMOSFETs
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Temperature influences on the drain leakage current behavior in graded-channel SOI nMOSFETs

Marcello Bellodi João Antonio Martino 1959-; International Symposium on Microelectronics Technology and Devices SBMICRO (20. 2005 Florianópolis)

Claeys, C.; Swart, J. W.; Morimoto, N. I.; Verdonck, P., eds. Microelectronics Technology and Devices SBMICRO 2005 Pennington : The Electrochemical Society, 2005. Proceedings v. 2005-08

Pennington The Electrochemical Society 2005

Item não circula. Consulte sua biblioteca.(Acessar)

4
Determination of the ion density and electron temperature using a planar electrostatic probe
Determination of the ion density and electron temperature using a planar electrostatic probe
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Determination of the ion density and electron temperature using a planar electrostatic probe

Laura Swart Patrick Bernard Verdonck 1958-; International Symposium on Microelectronics Technology and Devices SBMICRO (20. 2005 Florianópolis)

Claeys, C.; Swart, J. W.; Morimoto, N. I.; Verdonck, P., eds. Microelectronics Technology and Devices SBMICRO 2005 Pennington : The Electrochemical Society, 2005. Proceedings v. 2005-08

Pennington The Electrochemical Society 2005

Item não circula. Consulte sua biblioteca.(Acessar)

5
SU-8 low contrast process for multi-level e-beam lithography
SU-8 low contrast process for multi-level e-beam lithography
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

SU-8 low contrast process for multi-level e-beam lithography

R Catelli Antonio Carlos Seabra 1961-; International Symposium on Microelectronics Technology and Devices SBMICRO (20. 2005 Florianópolis)

Claeys, C.; Swart, J. W.; Morimoto, N. I.; Verdonck, P., eds. Microelectronics Technology and Devices SBMICRO 2005 Pennington : The Electrochemical Society, 2005. Proceedings v. 2005-08

Pennington The Electrochemical Society 2005

Item não circula. Consulte sua biblioteca.(Acessar)

6
A simple method to model nonrectangular-gate layout in SOI MOSFETs
A simple method to model nonrectangular-gate layout in SOI MOSFETs
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

A simple method to model nonrectangular-gate layout in SOI MOSFETs

Renato Camargo Giacomini João Antonio Martino 1959-; International Symposium on Microelectronics Technology and Devices SBMICRO (20. 2005 Florianópolis)

Claeys, C.; Swart, J. W.; Morimoto, N. I.; Verdonck, P., eds. Microelectronics Technology and Devices SBMICRO 2005 Pennington : The Electrochemical Society, 2005. Proceedings v. 2005-08

Pennington The Electrochemical Society 2005

Item não circula. Consulte sua biblioteca.(Acessar)

7
Photoluminescence in silicon-rich PECVD silicon oxynitride alloys
Photoluminescence in silicon-rich PECVD silicon oxynitride alloys
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Photoluminescence in silicon-rich PECVD silicon oxynitride alloys

M Ribeiro Inés Pereyra 1947-; International Symposium on Microelectronics Technology and Devices SBMICRO (2008 Gramado, RS)

SBMICRO 2008: Anais Pennington: The Electrochemical Society, 2008

Pennington The Electrochemical Society 2008

Item não circula. Consulte sua biblioteca.(Acessar)

8
Improved density of states and effective charge density in SI/PECVD Si/OxNy interface
Improved density of states and effective charge density in SI/PECVD Si/OxNy interface
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Improved density of states and effective charge density in SI/PECVD Si/OxNy interface

Katia Franklin Albertin Inés Pereyra 1947-; International Symposium on Microelectronics Technology and Devices SBMICRO (2008 Gramado, RS)

SBMICRO 2008: Anais Pennington: The Electrochemical Society, 2008

Pennington The Electrochemical Society 2008

Item não circula. Consulte sua biblioteca.(Acessar)

9
Implementation of an optical integrated pressure sensor and experimental results
Implementation of an optical integrated pressure sensor and experimental results
Material Type:
Livro 		Adicionar ao Meu Espaço

Implementation of an optical integrated pressure sensor and experimental results

Acácio Luiz Siarkowski Douglas Anderson Pereira Bulla; Nilton Itiro Morimoto 1962-; International Symposium on Microelectronics Technology and Devices SBMICRO (17 2002 Porto alegre)

Morimoto, N.I.; Ribas, P.R.; Verdonck, P.B., eds Microelectronics Technology and Devices SBMICRO 2002 Pennington : The Electrochemical Society, 2002

Pennington The Electrochemical Society 2002

Item não circula. Consulte sua biblioteca.(Acessar)

10
Influence of the back gate voltage on the total series resistence of fully depleted SOI MOSFETs at 300 K and 77 K
Influence of the back gate voltage on the total series resistence of fully depleted SOI MOSFETs at 300 K and 77 K
Material Type:
Livro 		Adicionar ao Meu Espaço

Influence of the back gate voltage on the total series resistence of fully depleted SOI MOSFETs at 300 K and 77 K

Aparecido Sirley Nicolett João Antonio Martino 1959-; Eddy Simoen; Cor Claeys; International Symposium on Microelectronics Technology and Devices SBMICRO (17 2002 Porto Alegre, RS)

Morimoto, N.I.; Ribas, R.P.; Verdonck, P.B., eds Microelectronics Technology and Devices SBMICRO 2002 Pennington : The Electrochemical Society, 2002

Pennington The Electrochemical Society 2002

Item não circula. Consulte sua biblioteca.(Acessar)

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